+420 485 353 852|

cxi@tul.cz|

Staff


Device Department of advanced materials

Bruker high temperature tribometer

Bruker high temperature tribometer

doc. Ing. Stanislav Petrík, CSc.

T +420 48535 3672

E stanislav.petrik@tul.cz

Profilometer: measurement of the roughness of the surface and grooves after tests on the tribometer and scratch test

 
CMS hardness measurement

CMS hardness measurement

doc. Ing. Stanislav Petrík, CSc.

T +420 48535 3672

E stanislav.petrik@tul.cz

Measurement of hardness and other mechanical properties (Young's modulus) of thin (submicron) layers

 
Dip Coater

Dip Coater

Ing. Mateusz Fijalkowski, Ph.D.

E mateusz.fijalkowski@tul.cz

Preparation of homogeneous coatings on planar substrates

 
Charpyho kladivo Zwick HIT50P

Charpyho kladivo Zwick HIT50P

doc. Ing. Stanislav Petrík, CSc.

T +420 48535 3672

E stanislav.petrik@tul.cz

Impact and notch toughness measurements

 
Chemspeed

Chemspeed

Ing. Mateusz Fijalkowski, Ph.D.

E mateusz.fijalkowski@tul.cz

Robotic platform for chemical synthesis

 
Microwave reactor

Microwave reactor

Ing. Mateusz Fijalkowski, Ph.D.

E mateusz.fijalkowski@tul.cz

Hydro and solvothermal synthesis supported by MW field

 
Oxford Aztec

Oxford Aztec

doc. Ing. Stanislav Petrík, CSc.

T +420 48535 3672

E stanislav.petrik@tul.cz

Part of SEM
EDS System - AztecEnergy

  • X-Max detector
  • Qualitative and quantitative analysis of local chemical composition (from Be to Pu)

WDS System - INCAWave

  • INCAWave 500
  • Ultra-precise local chemical composition analysis
  • Energy range from 0.17 to 10.84 keV

EBSD System - AZtecHKL

  • HKLNordlysNano
  • Crystallographic information
 
Scratch tester Bruker

Scratch tester Bruker

doc. Ing. Stanislav Petrík, CSc.

T +420 48535 3672

E stanislav.petrik@tul.cz

Scratch test: measuring the adhesion of thin layers to the substrate

 
UV-VIS spectroscopy

UV-VIS spectroscopy

Ing. Mateusz Fijalkowski, Ph.D.

E mateusz.fijalkowski@tul.cz

Identification and structural characterization of organic compounds and determination of inorganic substances

 
Vacuum deposition chamber - RF PACVD/MS

Vacuum deposition chamber - RF PACVD/MS

doc. Ing. Stanislav Petrík, CSc.

T +420 48535 3672

E stanislav.petrik@tul.cz

Radio frequency plasma assisted chemical vapor deposition/magnetron sputtering

Vacuum deposition chamber in the shape of a cylinder: inner diameter   411 mm, height 393 mm

 

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